Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method

P. W. Wachulak,* C. A. Brewer, F. Brizuela, C. S. Menoni, W. Chao, E. H. Anderson, R. A. Bartels, J. J. Rocca, and M. C. Marconi National Science Foundation Engineering Research Center (NSF ERC) for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, Colorado 80523, USA Electrical and Computer Engineering Department, Colorado State University, Fort Collins, Colorado 80523, USA Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA *Corresponding author: [email protected]